Initiated chemical vapor deposition-based method for patterning polymer and metal microstructures on curved substrates

Advanced Materials

Volumn 24, Issue 48, 2012, Pages 6445-6450

  Petruczok, Christy D ^a   Gleason, Karen K ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

chemical vapor deposition; curved substrates; multifunctional surfaces; patterning; thin films

Indexed keywords

BIFUNCTIONAL; CHEMICAL VAPOR; CROSSLINKS; CURVED SUBSTRATES; GLASS RODS; METAL MICROSTRUCTURE; METAL PATTERNING; PATTERNING; POLYMER LAYERS; SCALABLE METHODS; UV EXPOSURE;

CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; POLYMERIC GLASS; SCALABILITY; THIN FILMS;

VAPORS;

10,12 TRICOSADIYNOIC ACID; 10,12-TRICOSADIYNOIC ACID; HEAVY METAL; POLY(4 VINYLPYRIDINE); POLY(4-VINYLPYRIDINE); POLYACETYLENE DERIVATIVE; POLYDIACETYLENE; POLYMER; POLYVINYL DERIVATIVE; UNSATURATED FATTY ACID;

ARTICLE; CHEMICAL STRUCTURE; CHEMISTRY; PARTICLE SIZE; SURFACE PROPERTY; VOLATILIZATION;

FATTY ACIDS, UNSATURATED; METALS, HEAVY; MOLECULAR STRUCTURE; PARTICLE SIZE; POLYACETYLENES; POLYMERS; POLYVINYLS; SURFACE PROPERTIES; VOLATILIZATION;

EID: 84871302234     PISSN: 09359648     EISSN: 15214095     Source Type: Journal    
DOI: 10.1002/adma.201201975     Document Type: Article

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