An improvement in standard photolithography resolution based on Kirchhoff diffraction studies

Journal of Physics D: Applied Physics

Volumn 42, Issue 1, 2009, Pages

  Maalouf, Azar ^a   Gadonna, Michel ^a   Bosc, Dominique ^a  

^a UNIVERSITÉ DE RENNES 1   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; DIFFRACTIVE OPTICS; OPTICAL VARIABLES MEASUREMENT; PHOTOLITHOGRAPHY;

DIFFRACTION STUDIES; KIRCHHOFF; KIRCHHOFF DIFFRACTION THEORIES; RESOLUTION LIMITS; STANDARD PHOTOLITHOGRAPHIES; THIN LAYERS;

STANDARDS;

EID: 63649152614     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/1/015106     Document Type: Article

References (12)

1. Eldada L 2002 Polymer integrated optics: Promise vs. practicality Proc. SPIE 4642 1
2. Bosc D, Maalouf A, Grosso P, Haesaert S, Hardy I, Thual M and Batté T 2005 Potential of optical circuits integration with polymer technology ECIO'05 p 211
3. Zhao Y, Wang F, Cui Z C, Zheng J, Zhang H M, Zhang D M, Liu S Y and Yi M B 2004 Study of reactive ion etching process to fabricate the PMMA-based polymer waveguide Microelectron. J. 35 605
4. Rabiei P, Steier W H, Zhang C and Dalton L R 2002 Polymer micro-ring filters and modulators J. Lightwave Technol. 20 1968
5. Poon J K S, Huang Y, Paloczi G T and Yariv A 2004 Soft lithography replica molding of critically coupled polymer microring resonators IEEE Photon. Technol. Lett. 16 2496
6. Bosc D, Maalouf A, Henrio F and Haesaert S 2008 Strengthened polymethacrylate materials for optical waveguides and integrated functions Opt. Mater. 30 1514
7. Maalouf A, Bosc D, Henrio F, Haesaert S, Grosso P, Hardy I and Gadonna M 2006 Polymer optical circuits technology for large scale integration of passive functions Proc. SPIE 6183 61831H
8. Arnaud C, Féron P, Grosso P, Bosc D, Boustimi M and Guignard P 2003 FDTD simulation of 30 νm diameter polymer micro-ring Electron. Lett. 39 1249
9. Bourdillon A J, Boothroyd C B, Kong J R and Vladimirsky Y 2000 A critical condition in Fresnel diffraction used for ultra-high resolution lithographic printing J. Phys. D: Appl. Phys. 33 2133-41
10. Born M and Wolf E 1998 Principles of Optics: Electromagnetic Theory of Propagation Interference and Diffraction of Light 6th edn (Cambridge: Cambridge University Press) ISBN 0-521-63921-2 370-458
11. De Fornel F 1997 Les ondes évanescentes en optique et en optoélectronique (Eyrolls) ISBN 2-212-05254-5 35-38
12. Bosc D, Maalouf A, Haesaert S and Henrio F 2007 Some features of optical waveguide realization in polymer for large scale circuit integration Appl. Surf. Sci. 253 6162