Development of a colloidal lithography method for patterning nonplanar surfaces

Langmuir

Volumn 26, Issue 22, 2010, Pages 16662-16666

  Bhawalkar, Sarang P ^a   Qian, Jun ^a,b   Heiber, Michael C ^a   Jia, Li ^a  

^a The University of Akron   (United States)

^b TIANJIN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESIVE LAYERS; AIR WATER INTERFACES; COLLOIDAL LITHOGRAPHY; COLLOIDAL PARTICLE; LATERAL CAPILLARY FORCES; NON-PLANAR SURFACES; POLYMER ADHESIVES; SOFT LITHOGRAPHY; SURFACE CURVATURES;

AIR; LITHOGRAPHY;

PHASE INTERFACES;

WATER;

AIR; ARTICLE; CHEMISTRY; COLLOID; METHODOLOGY; PRINTING; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTY;

AIR; COLLOIDS; MICROSCOPY, ELECTRON, SCANNING; PRINTING; SURFACE PROPERTIES; WATER;

EID: 78650411177     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la1035147     Document Type: Article

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