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Journal of Power Sources

Volumn 228, Issue , 2013, Pages 89-96

Pulsed laser deposition of vanadium-doped manganese oxide thin films for supercapacitor applications

(1) Yang, Dongfang a

a NATIONAL RESEARCH COUNCIL CANADA (Canada)

Author keywords

Electrochemical capacitor; Manganese oxides; Pulsed laser deposition; Supercapacitor; Thin films; Vanadium doping

Indexed keywords

ACTIVE MATERIAL; ATOMIC PERCENTAGE; DIFFERENT SUBSTRATES; ELECTROCHEMICAL CAPACITOR; HIGH ENERGY; OXIDE THIN FILMS; OXYGEN GAS PRESSURE; SCAN RATES; SPECIFIC CAPACITANCE; STAINLESS STEEL SUBSTRATES; SUPER CAPACITOR; SUPERCAPACITOR APPLICATION; V-DOPING; VANADIUM DOPING;

AMORPHOUS SILICON; CAPACITORS; CRYSTALLINE MATERIALS; INTERNET PROTOCOLS; LASERS; MANGANESE; MANGANESE OXIDE; OXIDES; PULSED LASER DEPOSITION; SEMICONDUCTOR DOPING; SILICON WAFERS; SUBSTRATES; THIN FILMS; VANADIUM;

AMORPHOUS FILMS;

EID: 84870945111 PISSN: 03787753 EISSN: None Source Type: Journal
DOI: 10.1016/j.jpowsour.2012.11.067 Document Type: Article

Times cited : (36)

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