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Volumn 196, Issue 20, 2011, Pages 8843-8849
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Pulsed laser deposition of manganese oxide thin films for supercapacitor applications
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Author keywords
Electrochemical capacitor; Manganese oxides; Pulsed laser deposition; Supercapacitor; Thin films; Ultracapacitor
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Indexed keywords
ACTIVE MATERIAL;
AMORPHOUS PHASE;
AQUEOUS ELECTROLYTE;
CAPACITANCE VALUES;
CHEMICAL COMPOSITIONS;
CRYSTALLINE PHASIS;
CYCLIC DURABILITY;
DIFFERENT SUBSTRATES;
ELECTROCHEMICAL CAPACITOR;
ELECTROCHEMICAL MEASUREMENTS;
OXIDE THIN FILMS;
OXYGEN GAS PRESSURE;
OXYGEN PRESSURE;
PLD PROCESS;
PROCESSING PARAMETERS;
SCAN RATES;
SPECIFIC CAPACITANCE;
STAINLESS STEEL SUBSTRATES;
SUPER CAPACITOR;
SUPERCAPACITOR APPLICATION;
ULTRACAPACITORS;
AMORPHOUS FILMS;
CAPACITANCE;
CAPACITORS;
CRYSTALLINE MATERIALS;
CYCLIC VOLTAMMETRY;
DEPOSITION;
MANGANESE;
MANGANESE OXIDE;
OXIDE FILMS;
OXIDES;
OXYGEN;
PROGRAMMABLE LOGIC CONTROLLERS;
PULSED LASER DEPOSITION;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON WAFERS;
SODIUM;
STAINLESS STEEL;
SUBSTRATES;
THIN FILMS;
VAPOR DEPOSITION;
X RAY DIFFRACTION;
PULSED LASERS;
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EID: 79961030640
PISSN: 03787753
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jpowsour.2011.06.045 Document Type: Article |
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Times cited : (58)
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References (24)
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