Fabrication process for integrating nanoparticles with released structures using photoresist replacement of sublimated p-dichlorobenzene for temporary support

Journal of Microelectromechanical Systems

Volumn 21, Issue 6, 2012, Pages 1282-1284

  Hwang, Yongha ^a   Candler, Rob N ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Microfabrication; nanoparticle coupled resonators; photoresist (PR) support; stiction; sublimation drying

Indexed keywords

ETCH PROCESS; FABRICATION PROCESS; FABRICATION TECHNIQUE; P-DICHLOROBENZENE; RESONANT GAS; SACRIFICIAL OXIDE; SILICON MICRORESONATORS; TEMPORARY SUPPORT;

ELECTROMECHANICAL DEVICES; MEMS; MICROFABRICATION; PHOTORESISTS; STICTION;

NANOPARTICLES;

EID: 84870495109     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2012.2221160     Document Type: Article

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