Characterization and kinetic investigation of electroless deposition of pure cobalt thin films on silicon substrates

Applied Surface Science

Volumn 264, Issue , 2013, Pages 732-736

  Cheng, S L ^a   Hsu, T L ^a   Lee, T ^a   Lee, S W ^a   Hu, J C ^b   Chen, L T ^b  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Co thin film; Electroless deposition; Growth kinetic; Hydrazine; Transmission electron microscopy

Indexed keywords

ACTIVATION ENERGY; ARRHENIUS PLOTS; COBALT; COBALT DEPOSITS; CRYSTAL STRUCTURE; DEPOSITION RATES; ELECTROLESS PLATING; FILM GROWTH; GROWTH KINETICS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; HYDRAZINE; METALLIC FILMS; SILICON; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

CO THIN FILMS; ELECTROCHEMICAL MECHANISMS; ELECTROLESS PLATING PROCESS; HEXAGONAL CRYSTAL STRUCTURE; KINETIC INVESTIGATIONS; LINEAR RELATIONSHIPS; SILICON SUBSTRATES; TRANSMISSION ELECTRON;

THIN FILMS;

EID: 84870480915     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2012.10.111     Document Type: Article

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