Treatment and stability of sodium hyaluronate films in low temperature inductively coupled ammonia plasma

Plasma Chemistry and Plasma Processing

Volumn 32, Issue 5, 2012, Pages 1075-1091

  Grulich, O ^a   Kregar, Z ^b   Modic, M ^c   Vesel, A ^c   Cvelbar, U ^c   Mracek, A ^a   Ponizil, P ^a  

^a TOMAS BATA UNIVERSITY IN ZLIN   (Czech Republic)

^b INSTITUTE OF PHYSICS   (Croatia)

^c JO EF STEFAN INSTITUTE   (Slovenia)

Author keywords

Hyaluronan; Low temperature plasma; Surface modification; Surface treatment; XPS

Indexed keywords

AMMONIA PLASMA; DISCHARGE POWER; HYALURONAN; INCREASED DISCHARGES; INDUCTIVELY-COUPLED; LOW TEMPERATURE PLASMAS; LOW TEMPERATURES; NITROGEN CONCENTRATIONS; OPTICAL EMISSIONS; PROCESSING TIME; SAMPLE PROCESSING; SAMPLE SURFACE; SODIUM HYALURONATE; SURFACE SATURATION;

AMMONIA; ELECTROMAGNETIC INDUCTION; PLASMA STABILITY; PLASMAS; SODIUM; SURFACE TREATMENT; TEMPERATURE; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRIC DISCHARGES;

EID: 84870436541     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11090-012-9387-7     Document Type: Article

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