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Volumn 263, Issue , 2012, Pages 111-114

Titanium dioxide thin films deposited by pulsed laser deposition and integration in radio frequency devices: Study of structure, optical and dielectric properties

(6) Orlianges, Jean Christophe a Crunteanu, Aurelian b Pothier, Arnaud b Merle Mejean, Therese a Blondy, Pierre b Champeaux, Corinne a

a UNIVERSITY OF LIMOGES (France)

b UNIVERSITY OF LIMOGES (France)

Author keywords

Dielectric permittivity; Ellipsometry; Pulsed laser deposition; Raman; Surface characterization; Titanium dioxide

Indexed keywords

DIELECTRIC PROPERTIES OF SOLIDS; ELLIPSOMETRY; MEMS; MICROELECTROMECHANICAL DEVICES; OPTICAL PROPERTIES; OXIDE MINERALS; PERMITTIVITY; PULSED LASER DEPOSITION; PULSED LASERS; RADIO WAVES; SPECTROSCOPIC ELLIPSOMETRY; THIN FILMS; TITANIUM DIOXIDE; X RAY DIFFRACTION;

DIELECTRIC PERMITTIVITIES; MICRO ELECTROMECHANICAL SYSTEM (MEMS); OPTICAL AND DIELECTRIC PROPERTIES; RAMAN; SURFACE CHARACTERIZATION; TECHNOLOGICAL APPLICATIONS; TITANIUM DIOXIDE THIN FILM; TRANSMISSION MEASUREMENTS;

OPTICAL FILMS;

EID: 84869488977 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2012.09.010 Document Type: Article

Times cited : (14)

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