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Volumn , Issue , 2012, Pages 859-863

Plasma cleaning of TCO surfaces prior to CdS/CdTe deposition

Author keywords

Cadmium Telluride; Cleaning; Photovoltaic cells; Plasma surface treatment; Thin films

Indexed keywords

CDS; CDS/CDTE; CDTE; COATED SUBSTRATES; DEPOSITION SYSTEMS; FILL FACTOR; HOLLOW CATHODES; PLASMA CLEANERS; PLASMA CLEANING; PLASMA EXPOSURE; PLASMA SURFACE TREATMENT; SUPER-HYDROPHILIC; TRANSPARENT CONDUCTIVE OXIDES;

EID: 84869451166     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2012.6317738     Document Type: Conference Paper
Times cited : (11)

References (13)
  • 3
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  • 4
    • 0038209017 scopus 로고    scopus 로고
    • Effect of ion energy on photoresist etched in an inductively coupled, traveled wave driven, large area plasma source
    • K. Takechi, M. A. Lieberman. "Effect of ion energy on photoresist etched in an inductively coupled, traveled wave driven, large area plasma source.," Journal of Applied Physics, Vol 89 No.10, 2001.
    • (2001) Journal of Applied Physics , vol.89 , Issue.10
    • Takechi, K.1    Lieberman, M.A.2
  • 5
    • 0040208842 scopus 로고
    • An overview of ion sputtering physics and practical implications
    • C. P. Jean, "An overview of ion sputtering physics and practical implications," Journal of Materials Science, Vol. 18.5, 1983.
    • (1983) Journal of Materials Science , vol.18 , Issue.5
    • Jean, C.P.1
  • 6
    • 0037446079 scopus 로고    scopus 로고
    • Increased surface roughness by oxygen plasma treatment of graphite/polymer composite
    • U. Cvelbar, S. Pejovnik, M. Mozetie, A. Zalar, "Increased surface roughness by oxygen plasma treatment of graphite/polymer composite," Applied Surface Science, Vol. 210 No. 3, 2003.
    • (2003) Applied Surface Science , vol.210 , Issue.3
    • Cvelbar, U.1    Pejovnik, S.2    Mozetie, M.3    Zalar, A.4
  • 7
    • 0000313543 scopus 로고    scopus 로고
    • Patterning of highly oriented pyrolytic graphite by oxygen plasma etching
    • Xuekun Lu, Hui Huang, Nikolay Nemchuk, and Rodney S. Ruoff, "Patterning of highly oriented pyrolytic graphite by oxygen plasma etching," Applied Physics Letters, Vol. 75 No. 2, 1999.
    • (1999) Applied Physics Letters , vol.75 , Issue.2
    • Lu, X.1    Huang, H.2    Nemchuk, N.3    Ruoff, R.S.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.