Low-loss multiple-slot waveguides fabricated by optical lithography and atomic layer deposition

IEEE Photonics Technology Letters

Volumn 24, Issue 22, 2012, Pages 2074-2076

  Karvonen, Lasse ^a   Saynatjoki, Antti ^a   Chen, Ya ^a   Tu, Xiaoguang ^b   Liow, Tsung Yang ^b   Hiltunen, Jussi ^c   Hiltunen, Marianne ^c   Lo, Guo Qiang ^b   Honkanen, Seppo ^d  

^a AALTO UNIVERSITY   (Finland)

^b INSTITUTE OF MICROELECTRONICS   (Singapore)

^c VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

^d UNIVERSITY OF EASTERN FINLAND   (Finland)

Author keywords

Atomic layer deposition (ALD); integrated optics; slot waveguide

Indexed keywords

ATOMIC LAYER DEPOSITED; COMPATIBLE PROCESS; COMPLEMENTARY METAL OXIDE SEMICONDUCTORS; LOW TEMPERATURES; OXIDE LAYER; PROPAGATION LOSS; SILICON-BASED; SLOT WAVEGUIDE; THIN FILM LAYERS; TIO; TRANSVERSE ELECTRICS; TRANSVERSE MAGNETIC;

INTEGRATED OPTICS; PHOTOLITHOGRAPHY; POLARIZATION; TITANIUM DIOXIDE; WAVEGUIDES;

ATOMIC LAYER DEPOSITION;

EID: 84869419410     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/LPT.2012.2219856     Document Type: Article

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