Low-loss silicon slot waveguides and couplers fabricated with optical lithography and atomic layer deposition

Optics Express

Volumn 19, Issue 27, 2011, Pages 26275-26282

  Saynatjoki A ^a   Karvonen, L ^a   Alasaarela, T ^a,b   Tu, X ^c   Liow, T Y ^c   Hiltunen, M ^d   Tervonen, A ^a   Lo, G Q ^c   Honkanen, S ^a,e  

^a AALTO UNIVERSITY   (Finland)

^b Beneq Oy   (Finland)

^c INSTITUTE OF MICROELECTRONICS   (Singapore)

^d VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

^e UNIVERSITY OF EASTERN FINLAND   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COATINGS; ATOMIC LAYER DEPOSITION; ELECTRIC LOSSES; PHOTOLITHOGRAPHY; PHOTONIC DEVICES; SILICON; TEMPERATURE;

ATOMIC LAYER DEPOSITED; DEEP-UV LITHOGRAPHY; FILLING MATERIALS; LOW TEMPERATURE CMOS; ORDERS OF MAGNITUDE; SIGNAL TRANSMISSION; SILICON PLATFORMS; SILICON WAVEGUIDE;

WAVEGUIDES;

SILICON;

ARTICLE; CHEMISTRY; COMPUTER AIDED DESIGN; ENERGY TRANSFER; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; METHODOLOGY; OPTICAL INSTRUMENTATION; PHOTOGRAPHY; REFRACTOMETRY; SURFACE PLASMON RESONANCE;

COMPUTER-AIDED DESIGN; ENERGY TRANSFER; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; OPTICAL DEVICES; PHOTOGRAPHY; REFRACTOMETRY; SILICON; SURFACE PLASMON RESONANCE;

EID: 84555169142     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.19.026275     Document Type: Article

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