Magnetic properties of manganese implanted silicon after pulse plasma annealing

Vacuum

Volumn 89, Issue 1, 2013, Pages 113-117

  Werner, Z ^a   Pochrybniak, C ^a   Barlak, M ^a   Gosk, J ^b,c   Szczytko, J ^c   Twardowski, A ^c   Siwek, A ^d  

^a NATIONAL CENTRE FOR NUCLEAR RESEARCH   (Poland)

^b WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

^c UNIVERSITY OF WARSAW   (Poland)

^d AGH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Poland)

Author keywords

cRBS; Ion implantation; Lattice location; Magnetic properties; Pulse plasma annealing; Silicon

Indexed keywords

CRBS; CRYSTALLINE ORDER; ENERGY DENSITY; FLUENCES; LATTICE LOCATIONS; PARAMAGNETIC PHASE; PLASMA PULSE; PULSE PLASMAS; SILICON SAMPLES; SQUID MAGNETIZATION;

ION IMPLANTATION; MAGNETIC PROPERTIES; PARAMAGNETISM; SILICON;

MANGANESE;

EID: 84869096555     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2012.02.036     Document Type: Conference Paper

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