Post-etch residue removal using choline chloride-malonic acid deep eutectic solvent (DES)

Microelectronic Engineering

Volumn 102, Issue , 2013, Pages 81-86

  Taubert, Jenny ^a   Keswani, Manish ^a   Raghavan, Srini ^a  

^a University of Arizona   (United States)

Author keywords

BEOL cleaning; Deep eutectic solvent; Electrochemical impedance spectroscopy; Post etch residue removal

Indexed keywords

BACK END OF LINES; BEOL CLEANING; CHEMICAL SYSTEMS; CHOLINE CHLORIDE; DEEP EUTECTIC SOLVENTS; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY MEASUREMENTS; EUTECTIC COMPOSITION; EUTECTIC MIXTURE; MALONIC ACID; MOLAR RATIO; POST-ETCH RESIDUES; RESIDUE REMOVAL;

CARBOXYLIC ACIDS; CLEANING; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; EUTECTICS; PHOTOELECTRONS; PHOTORESISTS; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CHLORINE COMPOUNDS;

EID: 84869079598     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2011.11.014     Document Type: Conference Paper

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