Fabricating bi-layered metallic wire-grid polarizers by nanoimprint and O 2 plasma etching

Microelectronic Engineering

Volumn 102, Issue , 2013, Pages 53-59

  Chen, Chia Meng ^a   Niu, Pei Lun ^a   Sung, Cheng Kuo ^a   Chen, Cheng Huan ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Bi layered structure; Insertion structure; Metallic wire grid polarizer (WGP); Nanoimprint; O 2 plasma etching; Protrusion structure

Indexed keywords

ALUMINUM DEPOSITION; BI-LAYERED STRUCTURE; EFFICIENT PROCESS; ETCHING PERIODS; EXTINCTION RATIOS; INCIDENT ANGLES; INCIDENT LIGHT; NANO SCALE; NANO-IMPRINT; OPTICAL PERFORMANCE; P-POLARIZATION; PROPOSED ARCHITECTURES; WIRE GRATING; WIRE GRID POLARIZERS;

ALUMINUM; ALUMINUM COATINGS; CHEMICAL MECHANICAL POLISHING; LIGHT EXTINCTION; OPTICAL INSTRUMENTS; PLASMA ETCHING; POLARIZATION;

WIRE;

EID: 84869079236     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2012.05.025     Document Type: Conference Paper

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