Influence of precursor chemistry on morphology and composition of CVD-grown SnO 2 nanowires

Chemistry of Materials

Volumn 24, Issue 21, 2012, Pages 4028-4035

  Müller, Ralf ^a   Hernandez Ramirez, Francisco ^b   Shen, Hao ^a   Du, Hongchu ^c   Mader, Werner ^c   Mathur, Sanjay ^a  

^a UNIVERSITY OF COLOGNE   (Germany)

^b UNIVERSITY OF BARCELONA   (Spain)

^c UNIVERSITY OF BONN   (Germany)

Author keywords

chemical vapor deposition; gas sensing; molecular precursor; Sn 2+ disproportionation; tin alkoxide; VLS growth mechanism

Indexed keywords

ALKOXIDES; DISPROPORTIONATIONS; GAS SENSING; MOLECULAR PRECURSOR; VLS GROWTH MECHANISM;

CHEMICAL VAPOR DEPOSITION; GOLD; INTERMETALLICS; MORPHOLOGY; NANOWIRES; SURFACE PROPERTIES; TIN OXIDES; TRANSMISSION ELECTRON MICROSCOPY; VAPORS;

TIN;

EID: 84869015659     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm300913h     Document Type: Article

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