Plasma treatment of SnO2 nanocolumn arrays deposited by liquid injection plasma-enhanced chemical vapor deposition for gas sensors

Sensors and Actuators, B: Chemical

Volumn 138, Issue 1, 2009, Pages 201-206

  Huang, Hui ^a   Lee, Y C ^a   Chow, C L ^a   Tan, O K ^a   Tse, M S ^a   Guo, J ^b   White, T ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Gas sensor; Liquid injection plasma enhance chemical vapor deposition; Nanocolumn arrays; Plasma treatment

Indexed keywords

ANNEALING; BINDING ENERGY; CHEMICAL SENSORS; CHEMISORPTION; ELECTRODEPOSITION; GAS DETECTORS; LIQUIDS; OXYGEN; PLASMA DEPOSITION; PLASMAS; SILICON COMPOUNDS; STOICHIOMETRY; SUBSTRATES; TIN; VAPOR DEPOSITION; VAPORS; X RAY PHOTOELECTRON SPECTROSCOPY;

AGING EFFECTS; AVERAGE COMPOSITIONS; CHEMISORBED OXYGENS; GAS SENSOR; LIQUID INJECTION PLASMA-ENHANCE CHEMICAL VAPOR DEPOSITION; NANO-COLUMNS; NANOCOLUMN ARRAYS; O LATTICES; OXYGEN SPECIES; PLASMA TREATMENT; PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITIONS; SENSING PROPERTIES; SENSING RESPONSE; SI SUBSTRATES; SUBSTRATE HEATING; THERMAL-ANNEALING; X-RAY PHOTOELECTRON SPECTROSCOPIES;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 63749129825     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2009.02.034     Document Type: Article

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