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Volumn 101, Issue 18, 2012, Pages

Defeating the trade-off between process complexity and electrical performance with vertical zinc oxide transistors

Author keywords

[No Author keywords available]

Indexed keywords

CHANNEL LENGTH; ELECTRICAL PERFORMANCE; GATE METALS; LOW VOLTAGES; LOW-TEMPERATURE PROCESS; METAL OXIDE SEMICONDUCTOR; MOBILITY VALUE; ON/OFF CURRENT RATIO; PROCESS COMPLEXITY; SHORT-CHANNEL DEVICES; VERTICAL TRANSISTORS;

EID: 84868651419     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4765340     Document Type: Article
Times cited : (18)

References (18)
  • 2
    • 84868641342 scopus 로고    scopus 로고
    • in, edited by C. R. Kagan and P. Andry (Marcel Dekker, New York)
    • J. Jang, in Thin Film Transistors, edited by, C. R. Kagan, and, P. Andry, (Marcel Dekker, New York, 2003), pp. 33-65.
    • (2003) Thin Film Transistors , pp. 33-65
    • Jang, J.1
  • 9
    • 79551666200 scopus 로고
    • in, edited by Y. Hamakawa, P. G. LeComber, A. Madan, P. C. Taylor, and M. J. Thompson, (Mater. Res. Soc. Sym Proc.), Vol. 118
    • M. Hack, J. G. Shaw, and M. Shur, in Amorphous Silicon Technology, edited by, Y. Hamakawa, P. G. LeComber, A. Madan, P. C. Taylor, and, M. J. Thompson, (Mater. Res. Soc. Symp. Proc., 1988), Vol. 118, p. 207.
    • (1988) Amorphous Silicon Technology , pp. 207
    • Hack, M.1    Shaw, J.G.2    Shur, M.3
  • 11
    • 19144368309 scopus 로고    scopus 로고
    • 10.1063/1.1821629
    • L. Ma and Y. Yang, Appl. Phys. Lett. 85, 5084 (2004). 10.1063/1.1821629
    • (2004) Appl. Phys. Lett. , vol.85 , pp. 5084
    • Ma, L.1    Yang, Y.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.