Morphological evolution of CuCl microstructures from nano/micro-rod arrays to thin film with a preferred orientation (1 1 1) plane

Journal of Alloys and Compounds

Volumn 549, Issue , 2013, Pages 341-347

  Wang, Qun ^a   Chen, Gang ^a   Pei, Jian ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Growth from vapor; Halides; Nanostructures; Semiconducting materials

Indexed keywords

1D NANOCRYSTALS; CATALYST-FREE; ELECTRICAL CONDUCTIVITY; GAS ATMOSPHERE; GROWTH FROM VAPORS; HALIDES; HIGH-DENSITY ARRAYS; MORPHOLOGICAL EVOLUTION; NANOROD ARRAYS; POLYCRYSTALLINE FILM; PREFERRED ORIENTATIONS; SEMICONDUCTING MATERIALS; STRUCTURE AND MORPHOLOGY; TRANSMISSION ELECTRON MICROSCOPY TEM; VACUUM VAPOR DEPOSITION; WELL-ALIGNED;

AMMONIA; ELECTRIC CONDUCTIVITY; FILM PREPARATION; MICROSTRUCTURE; NANORODS; NANOSTRUCTURES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR GROWTH; SILICON WAFERS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VAPORS; X RAY DIFFRACTION;

COPPER COMPOUNDS;

EID: 84868231233     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2012.09.052     Document Type: Article

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