Direct growth of periodic silicon nanostructures on imprinted glass for photovoltaic and photonic applications

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 9, Issue 10-11, 2012, Pages 2079-2082

  Becker, Christiane ^a   Preidel, Veit ^a   Sontheimer, Tobias ^a   Klimm, Carola ^a   Rudigier Voigt, Eveline ^b   Bockmeyer, Matthias ^b   Rech, Bernd ^a  

^a HAHN MEITNER INSTITUT   (Germany)

^b SCHOTT AG   (Germany)

Author keywords

Electron beam evaporation; Nanoimprint; Photonic crystals; Silicon nanostructures; Thin film solar cells

Indexed keywords

2-D PHOTONIC CRYSTALS; ABSORPTION ENHANCEMENT; CRYSTALLINE SILICONS; DIRECT GROWTH; ELECTRON BEAM EVAPORATION; ENHANCEMENT FACTOR; GLASS SUBSTRATES; HIGH RATE; LIGHT PATH; LIGHT-TRAPPING; NANO-IMPRINT; NANO-STRUCTURED; NEAR-INFRARED WAVELENGTH; PATTERNED SILICON; PHOTONIC APPLICATION; PHOTONIC BAND STRUCTURES; PHOTOVOLTAIC; PHOTOVOLTAIC DEVICES; PROCESSING STEPS; REFLECTION MEASUREMENTS; SILICON NANOSTRUCTURES; TELECOMMUNICATION WAVELENGTHS; THIN-FILM SOLAR CELLS; TWO-DIMENSIONAL PHOTONIC CRYSTALS;

EVAPORATION; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; PHASE TRANSITIONS; PHOTONIC CRYSTALS; POLYSILICON; SOLAR CELLS; SUBSTRATES;

PERIODIC STRUCTURES;

EID: 84867930579     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.201200158     Document Type: Article

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