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Volumn 5, Issue 10-11, 2011, Pages 376-378

Large-area fabrication of equidistant free-standing Si crystals on nanoimprinted glass

Author keywords

Nanoimprinting; Nanostructures; Silicon; Solar cells; Thin films

Indexed keywords

ABSORPTION PROPERTY; AMORPHOUS SI; CELL ARCHITECTURES; ELECTRON BEAM EVAPORATION; FEATURE SIZES; HIGH-RATE DEPOSITION; LOW COST FABRICATION; NANO-IMPRINTING; PERIODIC ARRAYS; PRECISE CONTROL; PREPARATION PROCESS; SELECTIVE ETCH; SI CRYSTALS; SOLID PHASE CRYSTALLIZATION;

EID: 80155156959     PISSN: 18626254     EISSN: 18626270     Source Type: Journal    
DOI: 10.1002/pssr.201105437     Document Type: Article
Times cited : (20)

References (15)
  • 10
    • 80155162430 scopus 로고    scopus 로고
    • Proc. of the 24th European Photovoltaics Solar Energy Conference, Hamburg, Germany
    • E. Rudigier-Voigt, M. Bockmeyer, V. Hagemann, and S. Bauer, in: Proc. of the 24th European Photovoltaics Solar Energy Conference, Hamburg, Germany 2009, p. 2884.
    • (2009) , pp. 2884
    • Rudigier-Voigt, E.1    Bockmeyer, M.2    Hagemann, V.3    Bauer, S.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.