Investigation on preparing boron nitride by nitriding pure boron at 1200–1550 °C

Progress in Natural Science: Materials International

Volumn 22, Issue 5, 2012, Pages 433-439

  Ye, Fang ^a,b   Zhang, Litong ^a,b   Liu, Yongsheng ^a,b   Li, Siwei ^c   Su, Meng ^a,b   Yin, Xiaowei ^a,b   Cheng, Laifei ^a,b  

^a NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

^b NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

^c XIAMEN UNIVERSITY   (China)

Author keywords

Boron; Boron nitride; Kinetics; Nitridation; Thermodynamics

Indexed keywords

ATMOSPHERIC TEMPERATURE; BORON NITRIDE; CHEMICAL VAPOR DEPOSITION; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; III-V SEMICONDUCTORS; MICROSTRUCTURE; NITRIDATION; NITRIDES; NITRIDING; SCANNING ELECTRON MICROSCOPY; THERMOANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON SUBSTRATES; CHEMICAL VAPOUR DEPOSITION; CONDITION; ENERGY DISPERSIONS; NITRIDATION TEMPERATURE; NITROGEN SOURCES; PURE BORON; REACTION MECHANISM; RISING TEMPERATURES; THERMO DYNAMIC ANALYSIS;

ALUMINUM NITRIDE;

EID: 84867896037     PISSN: 10020071     EISSN: 17455391     Source Type: Journal    
DOI: 10.1016/j.pnsc.2012.09.001     Document Type: Article

References (17)

1. Naslain, R., Guette, A., Rebillat, F., Pailler, R., Langlais, F., Bourrat, X., Journal of Solid State Chemistry, 177, 2004, 449.
2. Wu, H.T., Chen, M.W., Wei, X., Ge, M., Zhang, W.G., Applied Surface Science, 257, 2011, 1276.
3. Kerans, R.J., Hay, R.S., Parthasarathy, T.A., Cini-bulk, M.K., Journal of the American Ceramic Society, 85, 2005, 2599.
4. Zheng, Y.T., Li, H.B., Zhou, T., Materials Science Engineering A, 540, 2012, 102.
5. Lee, K.S., Kim, Y.S., Tosa, M., Kasahara, A., Yosihara, K., Applied Surface Science, 169–170, 2001, 420.
6. Gallet, S.L., Chollon, G., Rebillat, F., Guette, A., Bourrat, X., Naslain, R., Couzib, M., Bruneel, J.L., Journal of the European Ceramic Society, 24, 2004, 33.
7. Cheng, Y., Yin, X.W., Liu, Y.S., Li, S.W., Cheng, L.F., Zhang, L.T., Surface and Coatings Technology, 204, 2010, 2797.
8. Foryst, E.P., Fitzner, K., Microchimica Acta, 125, 1997, 73.
9. Shen, L., Tan, B.J., Willis, W.S., Galasso, F.S., Suib, S.L., Journal of the American Ceramic Society, 22, 1994, 1011.
10. Campbell, S.S., Gonczy, S.T., Ceramic Engineering and Science Proceedings, 15, 1994, 327.
11. Li, S.W., Zhang, L.T., Ye, F., Liu, Y.S., Cheng, L.F., Feng, Z.D., Chen, L.F., Journal of the American Ceramic Society, 94, 2011, 679.
12. Liu, Y.S., Cheng, L.F., Zhang, L.T., Wu, S.J., Li, D., Xu, Y.D., Materials Science Engineering A, 466, 2007, 172.
13. Jörg, A., Neuschütz, D., Zimmermann, E., Journal de Physique IV, 5, 1995, 157.
14. Kuznetsov, F.A., Golubenko, A.N., Kosinova, M.L., Applied Surface Science, 113, 1997, 638.
15. Turkevich, V.Z., Journal of Physics: Condensed Matter, 14, 2002, 10963.
16. Naslain, R., Ceramic Transactions, 58, 1995, 23.
17. Condon, J.B., Holcombe, C.E., Johnson, D.H., Steckel, L.M., Inorganic Chemistry, 15, 1976, 2173.