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Volumn 22, Issue 42, 2012, Pages 22678-22685

Thermal annealing of colloidal monolayer at the air/water interface: A facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography

Author keywords

[No Author keywords available]

Indexed keywords

AIR WATER INTERFACES; CATALYTIC PROPERTIES; COLLOIDAL CRYSTALS; COLLOIDAL MASKS; COLLOIDAL MONOLAYERS; COLLOIDAL SPHERE; FLEXIBLE CONTROL; HIGH-QUALITY LATEX; HYDROTHERMAL REACTOR; NANOPARTICLE ARRAY; NANOSPHERE LITHOGRAPHY; SELF-ASSEMBLY METHOD; THERMAL ANNEALING PROCESS; THERMAL-ANNEALING; WATER SURFACE;

EID: 84867341617     PISSN: 09599428     EISSN: 13645501     Source Type: Journal    
DOI: 10.1039/c2jm33660j     Document Type: Article
Times cited : (44)

References (38)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.