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Volumn 22, Issue 42, 2012, Pages 22678-22685
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Thermal annealing of colloidal monolayer at the air/water interface: A facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography
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Author keywords
[No Author keywords available]
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Indexed keywords
AIR WATER INTERFACES;
CATALYTIC PROPERTIES;
COLLOIDAL CRYSTALS;
COLLOIDAL MASKS;
COLLOIDAL MONOLAYERS;
COLLOIDAL SPHERE;
FLEXIBLE CONTROL;
HIGH-QUALITY LATEX;
HYDROTHERMAL REACTOR;
NANOPARTICLE ARRAY;
NANOSPHERE LITHOGRAPHY;
SELF-ASSEMBLY METHOD;
THERMAL ANNEALING PROCESS;
THERMAL-ANNEALING;
WATER SURFACE;
ANNEALING;
NANOMAGNETICS;
NANOSPHERES;
POLYSTYRENES;
MONOLAYERS;
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EID: 84867341617
PISSN: 09599428
EISSN: 13645501
Source Type: Journal
DOI: 10.1039/c2jm33660j Document Type: Article |
Times cited : (44)
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References (38)
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