Nano-imprinting lithography of P(VDF-TrFE-CFE) for flexible freestanding MEMS devices

Microelectronic Engineering

Volumn 100, Issue , 2012, Pages 41-46

  Shklovsky, Jenny ^a   Engel, Leeya ^a   Sverdlov, Yelena ^a   Shacham Diamand, Yosi ^a   Krylov, Slava ^a  

^a TEL AVIV UNIVERSITY   (Israel)

Author keywords

Electrostrictive polymer; Fluoropolymers; Imprinting lithography; Microprocessing; P(VDF TrFE CFE); Polymer MEMS

Indexed keywords

ACTIVE MATERIAL; ALTERNATIVE METHODS; CHLOROFLUOROETHYLENE; DODECYLTRICHLOROSILANE; ELECTROSTRICTIVE POLYMERS; FREE STANDING MEMBRANES; IMPRINTING LITHOGRAPHY; MEMSDEVICES; MICRO PROCESSING; MICRON SCALE; MICRON-SCALE RESOLUTION; NANO-IMPRINTING; POLYMER MEMS; SACRIFICIAL LAYER; SI SUBSTRATES; THERMOPLASTIC PROPERTIES;

ELECTROMECHANICAL DEVICES; FLUORINE CONTAINING POLYMERS; MEMS; PHOTORESISTS; POLYMERS; REINFORCED PLASTICS; SILICON; TERPOLYMERS;

LITHOGRAPHY;

EID: 84867336915     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2012.07.112     Document Type: Article

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