Effect of growth temperature on characteristics of Cr-doped ZnO nanorods by magnetron sputtering

Applied Physics A: Materials Science and Processing

Volumn 109, Issue 1, 2012, Pages 173-179

  Jin, C G ^a   Yu, T ^a   Wu, Z F ^b   Chen, X M ^c   Wu, X M ^a   Zhuge, L J ^a  

^a SOOCHOW UNIVERSITY   (China)

^b YANCHENG INSTITUTE OF TECHNOLOGY   (China)

^c HEFEI NORMAL UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BURSTEIN-MOSS EFFECTS; CR-DOPED; CRYSTALLINE QUALITY; DEPLETION REGION; FREE CARRIERS; GRAIN SIZE; HIGH GROWTH TEMPERATURES; NANORODS ARRAYS; RADIO FREQUENCY MAGNETRON SPUTTERING; RED SHIFT; SCATTERING AND ABSORPTION; SECONDARY PHASIS; WELL-ALIGNED; ZNO NANOROD; ZNO NANOSTRUCTURES;

ELECTRIC FIELDS; GROWTH TEMPERATURE; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; PHOTOELECTRONS; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC; ZINC OXIDE;

NANORODS;

EID: 84866740303     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-012-7030-3     Document Type: Article

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