Characterization of carbon nitride thin films deposited by microwave plasma chemical vapor deposition

Surface and Coatings Technology

Volumn 127, Issue 2-3, 2000, Pages 259-264

  Zhang, Y P ^a   Gu, Y S ^a   Chang, X R ^a   Tian, Z Z ^a   Shi, D X ^b   Zhang, X F ^b   Yuan, L ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b Chinese Academy   (China)

Author keywords

Carbon nitride; Microwave plasma chemical vapor deposition (MPCVD); Thin film

Indexed keywords

EID: 84866415389     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0257-8972(00)00571-5     Document Type: Article

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