Synthesis of superhydrophobic PTFE-like thin films by self- nanostructuration in a hybrid plasma process

Surface Science

Volumn 606, Issue 23-24, 2012, Pages 1825-1829

  Henry, Frédéric ^a   Renaux, Fabian ^b   Coppée, Séverine ^b   Lazzaroni, Roberto ^a,b   Vandencasteele, Nicolas ^c   Reniers, François ^c   Snyders, Rony ^a,b  

^a UNIVERSITY OF MONS   (Belgium)

^b MATERIA NOVA RESEARCH CENTER   (Belgium)

^c UNIVERSITÉ LIBRE DE BRUXELLES   (Belgium)

Author keywords

Interface wetting; Magnetron sputtering; Nanostructured materials; Superhydrophobic; Thin film coating

Indexed keywords

A-CARBON; AFM; ATOMIC RATIO; AVERAGE DISTANCE; AVERAGE HEIGHT; CHEMICAL COMPOSITIONS; CHEMICAL ETCHING; FLUORINE ATOMS; FLUORINE CONCENTRATIONS; HYBRID PLASMA; HYBRID PROCESS; INTERFACE WETTING; MIXTURE COMPOSITIONS; NANO STRUCTURATION; PLASMA-ASSISTED GROWTH; PREFERENTIAL SPUTTERING; REGULAR STRUCTURE; SUPERHYDROPHOBIC; SUPERHYDROPHOBICITY; THEORETICAL EVALUATION; THIN FILM SURFACES; THIN-FILM COATINGS; WATER CONTACT ANGLE;

ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; ETHYLENE; FLUORINE; GAS MIXTURES; HYDROPHOBICITY; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; PHOTOELECTRONS; SILICON WAFERS; THIN FILMS; WETTING; X RAY PHOTOELECTRON SPECTROSCOPY;

TOPOGRAPHY;

EID: 84866410472     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2012.07.025     Document Type: Article

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