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Volumn 12, Issue 9, 2012, Pages 4734-4737

OWL-based nanomasks for preparing graphene ribbons with sub-10 nm Gaps

Author keywords

Graphene; nanogap; nanoribbon; on wire lithography; silicon nanostructure

Indexed keywords

ELECTROCHEMICAL SYNTHESIS; ETCH MASK; GRAPHENE NANORIBBONS; LENGTH SCALE; METAL NANOWIRE; NANO-GAP; NANOGAPS; NANOMASKS; NANORIBBONS; ON-WIRE LITHOGRAPHY; REACTIVE ION ETCH; SILICON NANOSTRUCTURES;

EID: 84866326344     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl302171z     Document Type: Article
Times cited : (13)

References (35)
  • 5
    • 67649225738 scopus 로고    scopus 로고
    • Geim, A. K. Science 2009, 324, 1530
    • (2009) Science , vol.324 , pp. 1530
    • Geim, A.K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.