Block copolymer-templated chemical nanopatterning on pyrolyzed photoresist carbon films

Chemical Communications

Volumn 48, Issue 78, 2012, Pages 9741-9743

  Deng, Xin ^a,b   Buriak, Jillian M ^c   Dai, Pei Xia ^a   Wan, Li Jun ^a   Wang, Dong ^a  

^a INSTITUTE OF CHEMISTRY   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

^c UNIVERSITY OF ALBERTA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; COPOLYMER; DIAZONIUM COMPOUND;

ARTICLE; CHEMICAL PROCEDURES; CONTROLLED STUDY; NANOBIOTECHNOLOGY;

EID: 84866257008     PISSN: 13597345     EISSN: 1364548X     Source Type: Journal    
DOI: 10.1039/c2cc35010f     Document Type: Article

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