Mono-and multilayer formation by diazonium reduction on carbon surfaces monitored with atomic force microscopy "scratching"

Analytical Chemistry

Volumn 75, Issue 15, 2003, Pages 3837-3844

  Anariba, Franklin ^a   DuVall, Stacy H ^a   McCreery, Richard L ^a  

^a OHIO STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DERIVATIZATION PARAMETERS;

ATOMIC FORCE MICROSCOPY; CARBON; DEPOSITION; ELECTRIC CONDUCTANCE; ELECTRON TUNNELING; PHOTORESISTS; PYROLYSIS; REDUCTION; SURFACE REACTIONS; SURFACE TREATMENT;

MULTILAYERS;

AZOBENZENE DERIVATIVE; BIPHENYL; CARBON; DIAZONIUM COMPOUND; STILBENE; TERPHENYL DERIVATIVE;

ARTICLE; ATOMIC FORCE MICROSCOPY; FILM; REDUCTION; STATISTICAL ANALYSIS; THICKNESS;

EID: 0041561093     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac034026v     Document Type: Article

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