Fabrication of porous silicon by metal-assisted etching using highly ordered gold nanoparticle arrays

Nanoscale Research Letters

Volumn 7, Issue , 2012, Pages

  Scheeler, Sebastian P ^a   Ullrich, Simon ^a   Kudera, Stefan ^a   Pacholski, Claudia ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

Gold nanoparticles; Metal assisted etching; Nanolithography; Porous silicon; Self assembly

Indexed keywords

CATALYTIC SITES; COLLOIDAL GOLD NANOPARTICLES; DIRECT CONTACT; ETCHING MASKS; FLAME ANNEALING; FUNCTIONALIZATIONS; GOLD NANOPARTICLES; GOLD-NANOPARTICLE ARRAYS; HF SOLUTIONS; HF TREATMENT; METAL/SI INTERFACES; ORDERED ARRAY; PATTERN TRANSFERS; PIRANHA SOLUTIONS; PLASMA TREATMENT; PREPARATION CONDITIONS; SI SUBSTRATES; SI SURFACES; SIMPLE METHOD; SUBSTRATE SURFACE; WET CHEMICAL SYNTHESIS;

COATINGS; FABRICATION; HYDROPHILICITY; HYDROPHOBICITY; METAL NANOPARTICLES; METALS; NANOLITHOGRAPHY; PLASMA APPLICATIONS; POROUS SILICON; SELF ASSEMBLY; SILICON; SURFACE PROPERTIES;

ETCHING;

EID: 84866133404     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-7-450     Document Type: Article

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