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Volumn 6, Issue 7, 2009, Pages 1536-1540
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Chemical etching of Si by Ag nanocatalysts in HF-H2O 2: Application to multicrystalline Si solar cell texturisation
b
ZI Champfleuri
(France)
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Author keywords
[No Author keywords available]
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Indexed keywords
AG NANOPARTICLE;
ALTERNATIVE ROUTES;
AVERAGE VALUES;
CHEMICAL ETCHING;
DUPLEX STRUCTURES;
ELECTROLESS METHODS;
FILL FACTOR;
FRONT SURFACES;
MESOPOROUS;
MESOPOROUS LAYERS;
METAL-ASSISTED CHEMICAL ETCHING;
MULTICRYSTALLINE SI;
NANOCATALYSTS;
OXIDIZING SPECIES;
SI LAYER;
SI SURFACES;
SI WAFER;
DISSOLUTION;
ETCHING;
HYDROFLUORIC ACID;
METAL RECOVERY;
POLYSILICON;
REFLECTION;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON SOLAR CELLS;
SILVER;
SOLAR CELLS;
SURFACE STRUCTURE;
SWITCHING CIRCUITS;
SILICON WAFERS;
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EID: 70949091482
PISSN: 18626351
EISSN: None
Source Type: Journal
DOI: 10.1002/pssc.200881016 Document Type: Conference Paper |
Times cited : (24)
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References (9)
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