Observation of substrate orientation-dependent oxygen defect filling in thin WO 3-δ/TiO 2 pulsed laser-deposited films with in situ XPS at high oxygen pressure and temperature

Chemistry of Materials

Volumn 24, Issue 17, 2012, Pages 3473-3480

  Braun, Artur ^a,b   Aksoy Akgul, Funda ^c,d   Chen, Qianli ^a,e   Erat, Selma ^a,e,f   Huang, Tzu Wen ^a   Jabeen, Naila ^c,g   Liu, Zhi ^c   Mun, Bongjin S ^h,i   Mao, Samuel S ^c,j   Zhang, Xiaojun ^c,j  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^b UNIVERSITY OF HAWAII   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^d NIGDE UNIVERSITY   (Turkey)

^e ETH ZURICH   (Switzerland)

^f TOROS UNIVERSITY   (Turkey)

^g NATIONAL CENTRE FOR PHYSICS   (Pakistan)

^h Hanyang University   (South Korea)

ⁱ Gwangju Institute of Science and Technology (GIST)   (South Korea)

^j UNIVERSITY OF CALIFORNIA   (United States)

more..

Author keywords

defect filling ambient pressure XPS; diffusion barrier; interdiffusion; oxygen defect; oxygen vacancy; photoanode; photoelectrochemistry; photoemission spectroscopy; solar water splitting; thin film; TiO 2; tungsten oxide; valence band; WO 3; XPS

Indexed keywords

OXYGEN DEFECT; PHOTO-ELECTROCHEMISTRY; PHOTOANODE; SOLAR WATER SPLITTING; TIO; TUNGSTEN OXIDE; WO 3;

CHEMISORPTION; CORE LEVELS; CRYSTAL ORIENTATION; DESORPTION; DIFFUSION BARRIERS; INTERDIFFUSION (SOLIDS); OXIDE FILMS; OXIDES; OXYGEN; OXYGEN VACANCIES; PHOTOELECTRON SPECTROSCOPY; PHOTOELECTRONS; PULSED LASER DEPOSITION; SURFACE DEFECTS; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TUNGSTEN COMPOUNDS; VALENCE BANDS; X RAY PHOTOELECTRON SPECTROSCOPY;

SUBSTRATES;

EID: 84866110335     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm301829y     Document Type: Article

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