Crystallization of amorphous silicon thin films deposited by PECVD on nickel-metalized porous silicon

Nanoscale Research Letters

Volumn 7, Issue , 2012, Pages

  Slama, Sonia Ben ^a   Hajji, Messaoud ^a,b   Ezzaouia, Hatem ^a  

^a RESEARCH AND TECHNOLOGY CENTER OF ENERGY   (Tunisia)

^b UNIVERSITY OF SFAX   (Tunisia)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON THIN FILMS; AMORPHOUS THIN FILMS; CRYSTALLINE QUALITY; ELECTRICAL CHARACTERIZATION; HEAVILY DOPED; HIGH QUALITY; P-TYPE SILICON; POROUS LAYERS; POROUS SILICON LAYERS; SILICON THIN FILM; THERMAL-ANNEALING; THIN FILM SOLAR CELLS;

AMORPHOUS FILMS; AMORPHOUS SILICON; DOPING (ADDITIVES); ELECTRIC PROPERTIES; METALLIZING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POROUS SILICON;

THIN FILMS;

EID: 84866102446     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-7-464     Document Type: Article

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