Precise calibration of Mg concentration in Mg xZn 1-xO thin films grown on ZnO substrates

Journal of Applied Physics

Volumn 112, Issue 4, 2012, Pages

  Kozuka, Y ^a   Falson, J ^a   Segawa, Y ^b   Makino, T ^b   Tsukazaki, A ^a   Kawasaki, M ^a,b  

^a UNIVERSITY OF TOKYO   (Japan)

^b RIKEN   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DESIGNING STRUCTURES; DEVICE PERFORMANCE; DILUTE LIMIT; ELECTRICAL APPLICATIONS; FREE-EXCITON PEAK; GROWTH TECHNIQUES; LABORATORY ENVIRONMENT; LABORATORY EQUIPMENTS; LOCALIZED EXCITON; MG CONCENTRATIONS; MG CONTENT; QUANTITATIVE DETERMINATIONS; SECONDARY ION MASS SPECTROSCOPY; SOLUBILITY LIMITS; ZNO SUBSTRATE;

LABORATORIES; PHOTOLUMINESCENCE; SECONDARY ION MASS SPECTROMETRY; THIN FILMS; X RAY DIFFRACTION; ZINC OXIDE;

ZINC;

EID: 84865855106     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4748306     Document Type: Article

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