Plasma-assisted molecular beam epitaxy of high optical quality MgZnO films on Zn-polar ZnO substrates

Applied Physics Express

Volumn 1, Issue 9, 2008, Pages 0912021-0912023

  Nishimoto, Yoshio ^a   Nakahara, Ken ^a   Takamizu, Daiju ^a   Sasaki, Atsushi ^a   Tamura, Kentaro ^a   Akasaka, Shunsuke ^a   Yuji, Hiroyuki ^a   Fujii, Tetsuo ^a   Tanabe, Tetsuhiro ^a   Takasu, Hidemi ^a   Tsukazaki, Atsushi ^b   Ohtomo, Akira ^b   Onuma, Takeyoshi ^c   Chichibu, Shigefusa F ^c   Kawasaki, Masashi ^b,c,d  

^a ROHM CO LTD   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c TOHOKU UNIVERSITY   (Japan)

^d JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CERIUM ALLOYS; CRYSTAL GROWTH; LIGHT EMISSION; LUMINESCENCE; MAGNESIUM PRINTING PLATES; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; MOLECULAR DYNAMICS; OPTICAL PROPERTIES; PLASMAS; SEMICONDUCTING ZINC COMPOUNDS; SEMICONDUCTOR QUANTUM WIRES; ZINC; ZINC ALLOYS; ZINC OXIDE;

ATOMICALLY FLAT SURFACES; DECAY COMPONENTS; OPTICAL QUALITIES; PL LIFETIMES; ROCKING CURVES; X-RAY DIFFRACTIONS; ZNO SUBSTRATES;

OPTICAL FILMS;

EID: 57649106142     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.1.091202     Document Type: Article

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