Electrophoretic deposition of Ti 3 SiC 2 and texture development in a strong magnetic field

Journal of the American Ceramic Society

Volumn 95, Issue 9, 2012, Pages 2857-2862

  Mishra, Mrinalini ^a,b   Sakka, Yoshio ^a,b   Hu, Chungfeng ^c   Suzuki, Tohru S ^a   Uchikoshi, Tetsuo ^a   Besra, Laxmidhar ^d  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b UNIVERSITY OF TSUKUBA   (Japan)

^c NINGBO INSTITUTE OF MATERIALS TECHNOLOGY AND ENGINEERING   (China)

^d CSIR INSTITUTE OF MINERALS AND MATERIALS TECHNOLOGY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION STUDIES; DISPERSANTS; DISPERSION CHARACTERISTICS; ELECTROPHORETIC DEPOSITIONS; ISO-ELECTRIC POINTS; MAGNETIC FIELD DIRECTION; MAX-PHASE; ORIENTATION FACTORS; POLYETHYLENEIMINE; PREFERRED ORIENTATIONS; RHEOLOGICAL MEASUREMENTS; SPECIFIC FREE ENERGY; STRONG MAGNETIC FIELDS; SURFACE SITES; SUSPENSION PARAMETERS; TEXTURE DEVELOPMENT; TOP SURFACE;

ADSORPTION; DEPOSITION; ELECTROPHORESIS; MAGNETIC FIELDS; TEXTURES; X RAY DIFFRACTION ANALYSIS;

SILICON CARBIDE;

EID: 84865759825     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2012.05296.x     Document Type: Conference Paper

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