In XGa 1-XN films deposited by reactive RF-sputtering

Journal of Non-Crystalline Solids

Volumn 358, Issue 17, 2012, Pages 2362-2365

  Itoh, Takashi ^a   Hibino, Shun ^a   Sahashi, Tatsuro ^a   Kato, Yoshinori ^a   Koiso, Sunao ^a   Ohashi, Fumitaka ^a   Nonomura, Shuichi ^a  

^a GIFU UNIVERSITY   (Japan)

Author keywords

In XGa 1 XN; Low temperature deposition; Photo absorption layer material; Photosensitivity; Simultaneous reactive rf magnetron sputtering

Indexed keywords

COMPOSITION RATIO; LOW-TEMPERATURE DEPOSITION; OPTICAL BAND GAP ENERGY; PHOTOABSORPTIONS; RF-MAGNETRON SPUTTERING; RF-SPUTTERING; WURTZITES; XRD PEAKS;

GALLIUM NITRIDE; LIGHT SENSITIVE MATERIALS; MAGNETRON SPUTTERING; METALLIC FILMS; OPTICAL BAND GAPS; TEMPERATURE; ZINC SULFIDE;

PHOTOSENSITIVITY;

EID: 84865723565     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2012.01.023     Document Type: Conference Paper

References (7)

1. V.Y. Davydov, A.A. Klochikhin, V.V. Emtsev, D.A. Kurdyukov, S.V. Ivanov, V.A. Vekshin, F. Bechstedt, J. Furthmuller, J. Aderhold, J. Graul, A.V. Mudryi, H. Harima, A. Hashimoto, A. Yamamoto, and E.E. Haller Phys. Status Solidi B 234 2002 787 796
2. O. Jani, I. Ferguson, C. Honsberg, and S. Kurtz Appl. Phys. Lett. 91 2007 132117 132119
3. M. Horie, K. Sugita, A. Hashimoto, and A. Yamamoto Sol. Energy Mater. Sol. Cells 93 2009 1013
4. S. Nonomura, S. Kobayashi, T. Gotoh, S. Hirata, T. Ohmori, T. Itoh, S. Nitta, and K. Morigaki J. Non-Cryst. Solids 198-200 1996 174 177
5. I. Akasaki, and H. Amano Jpn. J. Appl. Phys. 36 1997 5393 5408
6. D.C. Look, D.C. Reynolds, W. Kim, O. Aktas, A. Botchkarev, A. Salvador, and H. Morkoc J. Appl. Phys. 80 1996 2960 2963
7. J.A. Kerr Strength of chemical bonds D.R. Lide, CRC Handbook of Chemistry and Physics 1996 9-51 9-62