Preparation and characterization of UV-sensitive chitosan for UV-cure with poly(ethylene glycol) dimethacrylate

Cellulose

Volumn 19, Issue 5, 2012, Pages 1689-1700

  Lin, Man Chin ^a   Tai, Hung Yin ^a   Ou, Ti Cheng ^a   Don, Trong Ming ^a  

^a TAMKANG UNIVERSITY   (Taiwan)

Author keywords

Chitosan; Cinnamoyl chloride; Graft copolymer; Poly(ethylene glycol) dimethacrylate; UV polymerization

Indexed keywords

AMINO GROUP; CINNAMOYL CHLORIDE; COPOLYMER MEMBRANE; CROSS-LINKING DENSITY; CROSSLINKER; DIMETHACRYLATES; FEEDING AMOUNT; GEL MEMBRANES; GRAFTING RATIO; HYDROXYL GROUPS; METHANE SULFONIC ACID; OPTIMUM PROPERTIES; PH SENSITIVE; PHOTO-INITIATOR; POLY(ETHYLENE GLYCOL) DIMETHACRYLATE; PROTECTION EFFICIENCY; PYRANOSE; SUBSTITUTION DEGREE; TENSILE MECHANICAL PROPERTIES; UV IRRADIATION; UV POLYMERIZATION;

CHITOSAN; CHLORINE COMPOUNDS; DEGRADATION; DENSITY (SPECIFIC GRAVITY); FREE RADICALS; GRAFT COPOLYMERS; GRAFTING (CHEMICAL);

POLYETHYLENE GLYCOLS;

EID: 84865419963     PISSN: 09690239     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10570-012-9758-5     Document Type: Article

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