Interrupted growth and photoelectrochemistry of Cu 2O and Cu particles on TiO 2

Electrochimica Acta

Volumn 80, Issue , 2012, Pages 354-361

  Zhao, Liang ^a   Dong, Wen ^a   Zheng, Fengang ^a   Fang, Liang ^a   Shen, Mingrong ^a  

^a SOOCHOW UNIVERSITY   (China)

Author keywords

Cuprous oxide; Electrochemical deposition; Photoelectrochemical properties; Titatium oxide film

Indexed keywords

CONTROLLABLE GROWTH; CUPROUS OXIDE; DEPOSITION PARAMETERS; DIFFERENT MECHANISMS; ELECTROCHEMICAL DEPOSITION; ELECTRODEPOSITION METHODS; FLAT SURFACES; GRAIN SIZE; MICRO-STRUCTURAL; MORPHOLOGICAL EVOLUTION; PHOTO-ELECTROCHEMISTRY; PHOTOCATALYTIC EFFICIENCY; PHOTOELECTROCHEMICAL MEASUREMENTS; PHOTOELECTROCHEMICAL PERFORMANCE; PHOTOELECTROCHEMICAL PROPERTIES; PHOTOELECTROCHEMICALS; TI SUBSTRATES; TIO; ZERO BIAS;

ELECTROCHEMISTRY; ELECTRODEPOSITION; OXIDE FILMS; REDUCTION; STAINLESS STEEL;

TITANIUM DIOXIDE;

EID: 84865268626     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2012.07.034     Document Type: Article

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