Study of annealing effects of cuprous oxide grown by electrodeposition technique

Solar Energy Materials and Solar Cells

Volumn 44, Issue 3, 1996, Pages 251-260

  Siripala, W ^a   Perera, L D R D ^a   De Silva, K T L ^b   Jayanetti, J K D S ^b   Dharmadasa, I M ^c  

^a UNIVERSITY OF KELANIYA   (Sri Lanka)

^b UNIVERSITY OF COLOMBO   (Sri Lanka)

^c SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

Author keywords

Copper oxide; Electrodeposition; Spectral response; Thermal annealing

Indexed keywords

ANNEALING; CRYSTALLOGRAPHY; ELECTRODEPOSITION; ENERGY GAP; HEAT TREATMENT; LIGHT ABSORPTION; LOW TEMPERATURE OPERATIONS; PHOTOCONDUCTIVITY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR GROWTH; THERMAL EFFECTS; X RAY DIFFRACTION;

BAND GAP; CUPROUS OXIDE; PHOTORESPONSE; SPECTRAL RESPONSE; THERMAL ANNEALING;

COPPER OXIDES;

EID: 0030287476     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/0927-0248(96)00043-8     Document Type: Article

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