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Volumn 20, Issue 33, 2010, Pages 6962-6967

Electrochemical deposition of copper oxide nanowires for photoelectrochemical applications

(8) Chen, Le a Shet, Sudhakar a Tang, Houwen a Wang, Heli a Deutsch, Todd a Yan, Yanfa a Turner, John a Al Jassim, Mowafak a

a NATIONAL RENEWABLE ENERGY LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED POTENTIALS; CATHODIC BIAS; COATED GLASS SUBSTRATES; COATED SUBSTRATES; ELECTROCHEMICAL DEPOSITION; ELECTROCHEMICAL PROCESS; FLUORINE DOPED TIN OXIDE; NEGATIVE POTENTIAL; OXIDATION STATE; PHOTOELECTROCHEMICAL APPLICATIONS; PHOTOELECTROCHEMICAL RESPONSE; POSITIVE POTENTIAL;

CHARGE TRANSFER; COPPER; FLUORINE; ION EXCHANGE; NANOWIRES; REDUCTION; SUBSTRATES; SURFACE ACTIVE AGENTS; TIN; TIN OXIDES; TITANIUM COMPOUNDS;

LEAD OXIDE;

EID: 77955490962 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/c0jm01228a Document Type: Article

Times cited : (95)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.