The properties of Al doped ZnO thin films deposited on various substrate materials by RF magnetron sputtering

Journal of Materials Science: Materials in Electronics

Volumn 23, Issue 8, 2012, Pages 1580-1586

  Wang, Xiaojin ^a   Zeng, Xiangbin ^a   Huang, Diqiu ^a   Zhang, Xiao ^a   Li, Qing ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; AL-DOPED ZNO; AZO FILMS; AZO THIN FILMS; COMPRESSION STRESS; CRYSTALLINE STRUCTURE; DIFFRACTION ANGLE; DIFFRACTION PEAKS; ELECTRICAL AND OPTICAL PROPERTIES; FLEXIBLE SUBSTRATE; POLYIMIDE FILM; PREFERRED ORIENTATIONS; PROPERTIES OF AL; PYRAMID STRUCTURE; RADIO FREQUENCY MAGNETRON SPUTTERING METHOD; RF-MAGNETRON SPUTTERING; SUBSTRATE MATERIAL; TRANSPARENT CONDUCTIVE; VARIOUS SUBSTRATES; VISIBLE LIGHT; WINDOW MATERIALS; WURTZITE PHASE; X RAY DIFFRACTOMETERS;

ALUMINUM; DIFFRACTION; ELECTRIC PROPERTIES; GLASS; MAGNETRON SPUTTERING; OPACITY; OPTICAL FILMS; POLYIMIDES; POLYMERIC FILMS; THIN FILMS; ZINC OXIDE; ZINC SULFIDE;

SUBSTRATES;

EID: 84864870179     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-012-0632-x     Document Type: Article

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