Low cost anisotropic etching of monocrystalline Si (1 0 0): Optimization using response surface methodology

Superlattices and Microstructures

Volumn 52, Issue 4, 2012, Pages 782-792

  Ali, Khuram ^a   Khan, Sohail Aziz ^a   Jafri, Mohd Zubir Mat ^a  

^a SCHOOL OF PHYSICS   (Malaysia)

Author keywords

Optimized surface texturing; Response surface methodology; Silicon solar cells; Tetramethyl ammonium hydroxide

Indexed keywords

ANTI-REFLECTION; ETCH RATES; HIGH-EFFICIENCY SOLAR CELLS; LIGHT-TRAPPING; LOW COSTS; MONOCRYSTALLINE; OPTIMIZATION OF PARAMETERS; PROCESS VARIABLES; RESPONSE SURFACE METHODOLOGY; SI SOLAR CELLS; SI(1 0 0); SOLUTION CONCENTRATION; SURFACE REFLECTANCE; SURFACE TEXTURES; SURFACE-TEXTURING; TETRAMETHYL AMMONIUM HYDROXIDE; TEXTURIZATION;

AMMONIUM COMPOUNDS; ANISOTROPIC ETCHING; ANTIREFLECTION COATINGS; OPTIMIZATION; REFLECTION; SILICON; SILICON SOLAR CELLS;

SURFACE PROPERTIES;

EID: 84864805190     PISSN: 07496036     EISSN: 10963677     Source Type: Journal    
DOI: 10.1016/j.spmi.2012.06.008     Document Type: Article

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