Influence of Co:Cu ratio on properties of Co-Cu films deposited at different conditions

Journal of Magnetism and Magnetic Materials

Volumn 324, Issue 22, 2012, Pages 3834-3838

  Karaagac, Oznur ^a   Kockar, Hakan ^a   Alper, Mursel ^b   Haciismailoglu, Murside ^b  

^a BALIKESIR UNIVERSITY   (Turkey)

^b ULUDAG UNIVERSITY   (Turkey)

Author keywords

Co Cu alloy; Electrodeposition; Film composition; Magnetic property; Microstructure

Indexed keywords

CO-CU ALLOYS; COMPOSITIONAL ANALYSIS; CU CONTENT; CU(1 1 1); DENDRITIC STRUCTURES; DENTRITIC STRUCTURE; DEPOSITION PARAMETERS; DEPOSITION POTENTIAL; EASY AXIS; ENERGY DISPERSIVE X RAY SPECTROSCOPY; FACE-CENTERED CUBIC STRUCTURE; FILM COMPOSITION; FILM PLANES; HIGH PH; PEAK INTENSITY; STRUCTURAL CHARACTERIZATION; XRD PATTERNS;

COBALT; ELECTRODEPOSITION; ELECTROLYTES; FILM THICKNESS; MAGNETIC PROPERTIES; METALLIC FILMS; MICROSTRUCTURE; SATURATION MAGNETIZATION; X RAY DIFFRACTION; X RAY SPECTROSCOPY;

COPPER;

EID: 84864756369     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2012.06.025     Document Type: Article

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