Parameters affecting microstructure and magnetoresistance of electrodeposited Co-Cu alloy films

Journal of Magnetism and Magnetic Materials

Volumn 304, Issue 2, 2006, Pages

  Safak, Mürside ^a   Alper, Mürsel ^a   Kockar, Hakan ^b  

^a ULUDAG UNIVERSITY   (Turkey)

^b BALIKESIR UNIVERSITY   (Turkey)

Author keywords

AMR; Co Cu films; Electrodeposition; Electrolyte pH; XRD

Indexed keywords

COBALT ALLOYS; CRYSTAL STRUCTURE; ELECTRODEPOSITION; ELECTROLYTES; MAGNETORESISTANCE; MICROSTRUCTURE; PH EFFECTS; SPECTROMETRY; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

ANISOTROPIC BEHAVIOR; CO-CU ALLOY FILMS; PLASMA ATOMIC EMISSION SPECTROMETRY; ROOM TEMPERATURE;

THIN FILMS;

EID: 33646914370     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2006.02.223     Document Type: Article

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