The pH dependence of Co-Cu alloy thin films fabricated on amorphous substrate by DC electrodeposition

IEEE Transactions on Magnetics

Volumn 41, Issue 2, 2005, Pages 930-932

  Liu, Qunxian ^a   Min, Ji Hyun ^a   Cho, Ji Ung ^a   Kim, Young Keun ^a  

^a Korea University   (South Korea)

Author keywords

Amorphous substrates; Co Cu thin films; Electrodeposition

Indexed keywords

AMORPHOUS MATERIALS; COBALT ALLOYS; COERCIVE FORCE; CURRENT DENSITY; ELECTRODEPOSITION; ELECTROLYTES; ENERGY DISPERSIVE SPECTROSCOPY; GIANT MAGNETORESISTANCE; MAGNETOMETERS; PH EFFECTS; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; TRANSMISSION ELECTRON MICROSCOPY;

AMORPHOUS SUBSTRATES; CATHODIC CURRENT DENSITY; CO-CU THIN FILMS; VIBRATING SAMPLE MAGNETOMETER;

THIN FILMS;

EID: 14544293509     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2004.842126     Document Type: Article

References (9)

1. W. S. Chwarzacher and D. S. Lashmore, "Giant magnetoresistance in electrodeposited films," IEEE Trans. Magn., vol. 32, no. 4, pp. 3133-3153, Jul. 1996.
2. Q. X. Liu, L. Peter, J. Toth, L. F. Kiss, A. Cziraki, and I. Bakoni, "The role of nucleation in the evolution of giant magnetoresistance with layer thicknesses in electrodeposited Co-Cu/Cu multilayers," J. Magn. Magn. Mater., vol. 280, pp. 60-74, 2004.
3. E. Chassaing, A. Morrone, and J. E. Schmidt, "Nanometric Cu-Co multilayers electrodeposited on indium-tin oxide glass," J. Electrochem. Soc., vol. 146, pp. 1794-1797, 1999.
4. E. Toth-Kadar, L. Peter, T. Becsei, J. Toth, L. Pogany, T. Tarnoczi, P. Kamasa, I. Bakonyi, G. Lang, A. Cziraki, and W. Schwarzacher, "Preparation and magnetoresistance characteristics of electrodeposited Ni-Cu alloys and Ni-Cu/Cu multilayers," J. Electrochem. Soc., vol. 147, pp. 3311-3318, 2000.
5. L. Peter, A. Cziraki, L. Pogany, Z. Kupay, I. Bakonyi, M. Uhlemann, M. Herrich, B. Arnold, T. Bauer, and K. Wetzig, "Microstructure and giant magnetoresistance of electrodeposited Co-Cu/Cu multilayers," J. Electrochem. Soc., vol. 148, pp. C168-C176, 2001.
6. G. R. Pattanaik, D. K. Pandya, and S. C. Kashyap, "Preparation of Cu-Co alloy thin films on n-Si by galvanostatic DC electrodeposition," J. Electrochem. Soc., vol. 149, pp. C363-C369, 2002.
7. T. Cohen-Hyama, W. D. Kaplan, D. Aurbach, Y. S. Cohen, and J. Yahalom, "Electrodeposition of granular Cu-Co alloys," J. Electrochem. Soc., vol. 150, pp. C28-C35, 2003.
8. G. L. Zhou, M. H. Yang, and C. P. Flynn, "Epitaxial growth of metastable Co-Cu alloys by a surface pump mechanism," Phys. Rev. Lett., vol. 77, pp. 4580-4583, 1996.
9. M. Cerisier, K. Attenborough, J. P. Cells, and C. Van Haesendonck, "Structure and magnetic properties of electrodeposited Co films onto Si(100)," Appl. Surf. Sci., vol. 166, pp. 154-159, 2000.