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Volumn , Issue , 2012, Pages 49-52

Au-free CMOS-compatible AlGaN/GaN HEMT processing on 200 mm Si substrates

Author keywords

200 mm; AlGaN GaN HEMT; Au free; CMOS compatible; e mode; GaN on Si

Indexed keywords

200 MM; ALGAN/GAN HEMTS; AU-FREE; CMOS COMPATIBLE; E-MODE; GAN-ON-SI;

EID: 84864754611     PISSN: 10636854     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ISPSD.2012.6229020     Document Type: Conference Paper
Times cited : (113)

References (7)
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    • K. Cheng et al., "AlGaN/GaN/AlGaN Double Heterostructures Grown on 200 mm Silicon (111) Substrates with High Electron Mobility," Appl. Phys. Express, Vol. 5, p. 011002 (2012).
    • (2012) Appl. Phys. Express , vol.5 , pp. 011002
    • Cheng, K.1
  • 2
    • 79953864316 scopus 로고    scopus 로고
    • Electrical properties, microstructure, and thermal stability of Ta-based ohmic contacts annealed at low temperature for GaN HEMTs
    • A. Malmros et al., "Electrical properties, microstructure, and thermal stability of Ta-based ohmic contacts annealed at low temperature for GaN HEMTs," Semicond. Sci. Technol., Vol. 26, p. 075006 (2011).
    • (2011) Semicond. Sci. Technol. , vol.26 , pp. 075006
    • Malmros, A.1
  • 5
    • 77649179512 scopus 로고    scopus 로고
    • Enhancement-Mode GaN MIS-HEMTs with n-GaN/i-AlN/n-GaN Triple Cap Layer and High-k Gate Dielectrics
    • March
    • M. Kanamura et al., "Enhancement-Mode GaN MIS-HEMTs With n-GaN/i-AlN/n-GaN Triple Cap Layer and High-k Gate Dielectrics", IEEE Electron Device Lett., Vol. 31, No. 3, p. 189, March 2010.
    • (2010) IEEE Electron Device Lett. , vol.31 , Issue.3 , pp. 189
    • Kanamura, M.1
  • 6
    • 47249146111 scopus 로고    scopus 로고
    • AlGaN/GaN Recessed MIS-Gate HFET with High-Threshold-Voltage Normally-Off Operation for Power Electronics Applications
    • July
    • T. Oka et al., "AlGaN/GaN Recessed MIS-Gate HFET With High-Threshold-Voltage Normally-Off Operation for Power Electronics Applications," IEEE Electron Device Lett., Vol. 29, No. 7, p. 668, July 2008.
    • (2008) IEEE Electron Device Lett. , vol.29 , Issue.7 , pp. 668
    • Oka, T.1
  • 7
    • 84860367803 scopus 로고    scopus 로고
    • CMOS Process-Compatible High-Power Low-Leakage AlGaN/GaN MISHEMT on Silicon
    • April in press
    • M. Van Hove et al., "CMOS Process-Compatible High-Power Low-Leakage AlGaN/GaN MISHEMT on Silicon", IEEE Electron Device Lett., Vol. 33, No. 04, April 2012 (in press).
    • (2012) IEEE Electron Device Lett. , vol.33 , Issue.4
    • Van Hove, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.