Thin films deposited by femtosecond pulsed laser ablation of tungsten carbide

Applied Surface Science

Volumn 258, Issue 23, 2012, Pages 9198-9201

  De Bonis, A ^a,d   Teghil, R ^a,d   Santagata, A ^b   Galasso, A ^a   Rau, J V ^c  

^a UNIVERSITY OF BASILICATA   (Italy)

^b CNR   (Italy)

^c CNR   (Italy)

^d INSTM ^*  (Italy)

Author keywords

Nanoparticles; Pulsed laser deposition; Tungsten carbide; Ultra short pulse laser

Indexed keywords

ABLATION; AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CARBON FILMS; LASER ABLATION; NANOPARTICLES; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; THERMAL EVAPORATION; THIN FILMS; TUNGSTEN CARBIDE; ULTRASHORT PULSES; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON CONTENT; COOLING RATES; DEPOSITED FILMS; FEMTOSECOND PULSED LASER ABLATION; GASEOUS PHASE; SUBSTRATE TEMPERATURE; ULTRA-SHORT PULSE LASER; ULTRA-SHORT PULSED;

PULSED LASERS;

EID: 84864485983     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.07.077     Document Type: Conference Paper

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