-
3
-
-
41049091205
-
-
Li.D. Zhao, B. Zhang, L. F Li, M. Zhou, W.S. Liu, and J. Liu J. Alloys Compd. 455 2008 259 264
-
(2008)
J. Alloys Compd.
, vol.455
, pp. 259-264
-
-
Zhao, Li.D.1
Zhang, B.2
Li L, F.3
Zhou, M.4
Liu, W.S.5
Liu, J.6
-
4
-
-
67349135766
-
-
P.G. Li, M. Lei, W.H. Tang, X. Guo, and X. Wang J. Alloys Compd. 477 2009 515 518
-
(2009)
J. Alloys Compd.
, vol.477
, pp. 515-518
-
-
Li, P.G.1
Lei, M.2
Tang, W.H.3
Guo, X.4
Wang, X.5
-
6
-
-
33748883047
-
-
J.X. Wang, X.W. Sun, Y. Yang, H. Huang, Y.C. Lee, O.K. Tan, and L. Vayssieres Nanotechnology 17 2006 4995 4998
-
(2006)
Nanotechnology
, vol.17
, pp. 4995-4998
-
-
Wang, J.X.1
Sun, X.W.2
Yang, Y.3
Huang, H.4
Lee, Y.C.5
Tan, O.K.6
Vayssieres, L.7
-
9
-
-
20144369634
-
-
M. Law, L.E. Greene, J.C. Johnson, R. Saykally, and P.D. Yang Nat. Mater. 4 2005 455 459
-
(2005)
Nat. Mater.
, vol.4
, pp. 455-459
-
-
Law, M.1
Greene, L.E.2
Johnson, J.C.3
Saykally, R.4
Yang, P.D.5
-
10
-
-
79956010166
-
-
C.J. Lee, T.J. Lee, S.C. Lyu, Y. Zhang, H. Ruh, and H.J. Lee Appl. Phys. Lett. 81 2001 3648 3650
-
(2001)
Appl. Phys. Lett.
, vol.81
, pp. 3648-3650
-
-
Lee, C.J.1
Lee, T.J.2
Lyu, S.C.3
Zhang, Y.4
Ruh, H.5
Lee, H.J.6
-
11
-
-
20944436871
-
-
D.K. Hwang, S.H. Kang, J.H. Lim, E.J. Yang, J.Y. Oh, J.H. Yang, and S.J. Park Appl. Phys. Lett. 86 2005 222101 222103
-
(2005)
Appl. Phys. Lett.
, vol.86
, pp. 222101-222103
-
-
Hwang, D.K.1
Kang, S.H.2
Lim, J.H.3
Yang, E.J.4
Oh, J.Y.5
Yang, J.H.6
Park, S.J.7
-
13
-
-
0037128628
-
-
N. Saito, H. Haneda, T. Sekiguchi, N. Ohashi, I. Sakaguchi, and K. Koumoto Adv. Mater. 14 2002 418 421
-
(2002)
Adv. Mater.
, vol.14
, pp. 418-421
-
-
Saito, N.1
Haneda, H.2
Sekiguchi, T.3
Ohashi, N.4
Sakaguchi, I.5
Koumoto, K.6
-
14
-
-
4043147737
-
-
Q.H. Li, Q. Wan, Y.J. Chen, T.H. Wang, H.B. Jia, and D.P. Yu Appl. Phys. Lett. 85 2004 636 638
-
(2004)
Appl. Phys. Lett.
, vol.85
, pp. 636-638
-
-
Li, Q.H.1
Wan, Q.2
Chen, Y.J.3
Wang, T.H.4
Jia, H.B.5
Yu, D.P.6
-
15
-
-
0029774658
-
-
K. Vanheusden, C.H. Saeger, W.L. Warren, D.R. Tallant, and J.A. Voight Appl. Phys. Lett. 68 1996 403 405
-
(1996)
Appl. Phys. Lett.
, vol.68
, pp. 403-405
-
-
Vanheusden, K.1
Saeger, C.H.2
Warren, W.L.3
Tallant, D.R.4
Voight, J.A.5
-
17
-
-
0033187596
-
-
Y. Lin, Z. Zhang, Z. Tang, F. Yuan, and J. Li Adv. Mater. Opt. Electron. 9 1999 205 209
-
(1999)
Adv. Mater. Opt. Electron.
, vol.9
, pp. 205-209
-
-
Lin, Y.1
Zhang, Z.2
Tang, Z.3
Yuan, F.4
Li, J.5
-
18
-
-
0037015772
-
-
K. Westermark, H. Rensmo, T.A.C. Lees, J.G. Vos, and H.T. Siegbahn J. Phys. Chem. B 106 2002 10108 10113
-
(2002)
J. Phys. Chem. B
, vol.106
, pp. 10108-10113
-
-
Westermark, K.1
Rensmo, H.2
Lees, T.A.C.3
Vos, J.G.4
Siegbahn, H.T.5
-
21
-
-
0000288835
-
-
Y.F. Chen, D.M. Bagnall, H.J. Koh, K.T. Park, K. Hiraga, Z.Q. Zhu, and T. Yao J. Appl. Phys. 84 1998 3912 3918
-
(1998)
J. Appl. Phys.
, vol.84
, pp. 3912-3918
-
-
Chen, Y.F.1
Bagnall, D.M.2
Koh, H.J.3
Park, K.T.4
Hiraga, K.5
Zhu, Z.Q.6
Yao, T.7
-
22
-
-
36049039133
-
-
S. Singh, P. Thiyagarajan, K.M. Kant, D. Anita, S. Thirupathiah, and N. Rama J Phys D: Appl. Phys 40 2007 6312 6327
-
(2007)
J Phys D: Appl. Phys
, vol.40
, pp. 6312-6327
-
-
Singh, S.1
Thiyagarajan, P.2
Kant, K.M.3
Anita, D.4
Thirupathiah, S.5
Rama, N.6
-
25
-
-
77957875780
-
-
S.K. Mohanta, D.C. Kim, B.H. Kong, H.K. Cho, W. Liu, and S. Tripathy Sci. Adv. Mater. 2 2010 64 68
-
(2010)
Sci. Adv. Mater.
, vol.2
, pp. 64-68
-
-
Mohanta, S.K.1
Kim, D.C.2
Kong, B.H.3
Cho, H.K.4
Liu, W.5
Tripathy, S.6
-
28
-
-
0033703938
-
-
H. Cao, J.Y. Xu, D.Z. Zhang, S.H. Chang, S.T. Ho, E.W. Seelig, X. Liu, and R.P.H. Chang Phys. Rev. Lett. 84 2000 5584 5587
-
(2000)
Phys. Rev. Lett.
, vol.84
, pp. 5584-5587
-
-
Cao, H.1
Xu, J.Y.2
Zhang, D.Z.3
Chang, S.H.4
Ho, S.T.5
Seelig, E.W.6
Liu, X.7
Chang, R.P.H.8
-
29
-
-
0035126240
-
-
M.H. Huang, Y. Wu, H. Feick, N. Tran, E. Weber, and P. Yang Adv. Mater. 13 2001 113 116
-
(2001)
Adv. Mater.
, vol.13
, pp. 113-116
-
-
Huang, M.H.1
Wu, Y.2
Feick, H.3
Tran, N.4
Weber, E.5
Yang, P.6
-
36
-
-
34249894720
-
-
M.Y. Ge, H.P. Wu, L. Niu, J.F. Liu, S.Y. Chen, P.Y. Shen, Y.W. Zeng, Y.W. Wang, G.Q. Zhang, and J.Z. Jiang J. Cryst. Growth. 305 2007 162 166
-
(2007)
J. Cryst. Growth.
, vol.305
, pp. 162-166
-
-
Ge, M.Y.1
Wu, H.P.2
Niu, L.3
Liu, J.F.4
Chen, S.Y.5
Shen, P.Y.6
Zeng, Y.W.7
Wang, Y.W.8
Zhang, G.Q.9
Jiang, J.Z.10
-
38
-
-
35348949676
-
-
N. Daneshvar, S. Aber, M.S. Seyed Dorraji, A.R. Khataee, and M.H. Rasoulifard Sep. Purif. Technol. 58 2007 91 98
-
(2007)
Sep. Purif. Technol.
, vol.58
, pp. 91-98
-
-
Daneshvar, N.1
Aber, S.2
Seyed Dorraji, M.S.3
Khataee, A.R.4
Rasoulifard, M.H.5
-
42
-
-
0033092773
-
-
S. Mahamuni, K. Borgohain, B.S. BendreValerie, J. Leppert, and S.H. Risbud J. Appl. Phys. 85 1999 2861 2865
-
(1999)
J. Appl. Phys.
, vol.85
, pp. 2861-2865
-
-
Mahamuni, S.1
Borgohain, K.2
Bendrevalerie, B.S.3
Leppert, J.4
Risbud, S.H.5
-
44
-
-
50649092665
-
-
G. Shan, M. Zhong, S. Wang, Y. Li, and Y. Liu J. Colloid Interface Sci. 326 2008 392 395
-
(2008)
J. Colloid Interface Sci.
, vol.326
, pp. 392-395
-
-
Shan, G.1
Zhong, M.2
Wang, S.3
Li, Y.4
Liu, Y.5
-
45
-
-
0141828227
-
-
Y.J. Xing, Z.H. Xi, Z.Q. Xue, X.D. Zhang, J.H. Song, R.M. Wang, J. Xu, Y. Song, S.L. Zhang, and D.P. Yu Appl. Phys. Lett. 83 2003 1689 1691
-
(2003)
Appl. Phys. Lett.
, vol.83
, pp. 1689-1691
-
-
Xing, Y.J.1
Xi, Z.H.2
Xue, Z.Q.3
Zhang, X.D.4
Song, J.H.5
Wang, R.M.6
Xu, J.7
Song, Y.8
Zhang, S.L.9
Yu, D.P.10
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